After electrochemical etching, we have made a study of the effects generated on p +-type porous silicon layers when they are left in presence of the electrolyte for different post-etching times. Using an interferometric technique, we have monitored the change of its porosity during the post-etch process due to a chemical dissolution mechanism. These data are complemented with a study of photoluminescence and transmission electron microscopy measurements for different post-etching times. © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
|Titolo:||Structural and light-emission modification in chemically-etched porous silicon|
|Data di pubblicazione:||2005|
|Appare nelle tipologie:||1.1 Articolo su Rivista/Article|