Porous silicon free-standing coupled microcavities were grown by an electrochemical attack. The natural drift of the layer thickness and porosity was successfully compensated by changing the etching parameters in a controlled way. Potential applications for CMC structures with controlled optical parameters could be channel filtering within optical telecommunication devices.

Porous silicon free-standing coupled microcavities

OTON NIETO, CLAUDIO JOSE;
2003-01-01

Abstract

Porous silicon free-standing coupled microcavities were grown by an electrochemical attack. The natural drift of the layer thickness and porosity was successfully compensated by changing the etching parameters in a controlled way. Potential applications for CMC structures with controlled optical parameters could be channel filtering within optical telecommunication devices.
2003
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11382/511042
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