We have studied the properties of p+-type doped porous silicon, formed by electrochemical etching, when is left in presence of the electrolyte for different post-etching times. Using an interferometric technique, we monitored the formation of the porous silicon layer during the electrochemical treatment as well as the change of its porosity during the post-etch process due to a chemical dissolution mechanism. These data are complemented with a study of the photoluminescence modification for different post-etching times.
Chemical etching effects in porous silicon layers
OTON NIETO, CLAUDIO JOSE;
2003-01-01
Abstract
We have studied the properties of p+-type doped porous silicon, formed by electrochemical etching, when is left in presence of the electrolyte for different post-etching times. Using an interferometric technique, we monitored the formation of the porous silicon layer during the electrochemical treatment as well as the change of its porosity during the post-etch process due to a chemical dissolution mechanism. These data are complemented with a study of the photoluminescence modification for different post-etching times.File in questo prodotto:
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